Robust ultrathin porous polymer films would be gradually regarded as the enabler of next generation technologies, including flexible sensors, artificial skins, separators, antireflection and self-cleaning films. Nevertheless, both the creation and the application of these films have been extremely challenging owing to the insufficient mechanical strength of all reported ultrathin films. The fabrication of a new ultra-strong and highly flexible ultrahigh molecular weight polyethylene (UHMWPE) porous membrane is reported in this thesis. Both SEM and TEM evaluations of film morphology revealed a 2D Delaunay fibrous structure with randomly triangulated pores. Moreover, the tensile property of this film was at least twice as strong as that of solid stainless steel, with a measured in...[ Read more ]

Robust ultrathin porous polymer films would be gradually regarded as the enabler of next generation technologies, including flexible sensors, artificial skins, separators, antireflection and self-cleaning films. Nevertheless, both the creation and the application of these films have been extremely challenging owing to the insufficient mechanical strength of all reported ultrathin films. The fabrication of a new ultra-strong and highly flexible ultrahigh molecular weight polyethylene (UHMWPE) porous membrane is reported in this thesis. Both SEM and TEM evaluations of film morphology revealed a 2D Delaunay fibrous structure with randomly triangulated pores. Moreover, the tensile property of this film was at least twice as strong as that of solid stainless steel, with a measured in-plane tensile strength and ductility approximate to 1400 MPa and 50%, respectively. Its top surface was further aligned a monolayer graphene to be invented as a fully conformable piezoresistive skin sensor and a nano-vibrational diaphragm of clarity electrostatic speaker. In addition, other applications such as skin conformable sweat sensors, antibacterial films, turing pattern structures based on this nanomembrane were also elucidated in this thesis.