THESIS
2013
xvii, 157 pages : illustrations ; 30 cm
Abstract
Electric energy is essential in industrial and consumer applications. In order to generate,
distribute and use electric energy efficiently, power electronic systems are widely used. Modern
power electronic systems are based on power semiconductor devices, and the performance of a
power electronic system depends largely on the performance of the power semiconductor devices
that are used. Power semiconductor devices are required to have high breakdown voltage, low
leakage current, low on-resistance/on-state voltage drop, high input impedance and high
ruggedness.
In this thesis, power devices with a programmable V
TH are demonstrated by using a
silicon nitride-based charge trapping gate, which provides an additional flexibility in devi...[
Read more ]
Electric energy is essential in industrial and consumer applications. In order to generate,
distribute and use electric energy efficiently, power electronic systems are widely used. Modern
power electronic systems are based on power semiconductor devices, and the performance of a
power electronic system depends largely on the performance of the power semiconductor devices
that are used. Power semiconductor devices are required to have high breakdown voltage, low
leakage current, low on-resistance/on-state voltage drop, high input impedance and high
ruggedness.
In this thesis, power devices with a programmable V
TH are demonstrated by using a
silicon nitride-based charge trapping gate, which provides an additional flexibility in devices design. It is demonstrated in this thesis that this flexibility can result in significant improvement
in device performance. First, an SONOS gate power MOSFET (SG-MOSFET) with heavily
doped body region is proposed, demonstrated and characterized. The heavily doped body region
results in a much reduced base resistance of the parasitic BJT, and the avalanche energy
absorption of the SG-MOSFET at unclamped inductive switching (UIS) is 5.2 times that of the
conventional power MOSFET. Second, a planar SG-MOSFET with an ultra-shallow body region
is designed, demonstrated and characterized. The ultra-shallow body provides a much reduced
parasitic JFET resistance, and the non-optimized R
ON•Q
G product of the device is comparable to
that of trench power MOSFETs fabricated using more advanced technologies. Third, threshold
voltage (V
TH) stability of the ultra-shallow body SG-MOSFET under hot carrier injection
conditions is characterized and discussed. Experimental results indicate that hot electron injection
will increase the V
TH from 1 V to 2 V in the lifetime of 10 years, while hot hole injection has no
significant influence on the V
TH stability. Finally, an SNOS gated, normally-off PIN diode
(SGNOD) is proposed and experimentally demonstrated. The SGNOD has an extremely low on-state voltage drop of 1.7 V, and the on-state voltage drop is about 0.6 V lower than that of an
IGBT, resulting in about 26% reduction in the conduction loss.
Post a Comment