Recently, organic light emitting diodes (OLEDs) have received great attention because of its great potential application in flat panel displays. In this dissertation, a new fabrication process for small pixel and high resolution passive matrix organic light emitting device (PMOLED) is developed. Besides, some ITO surface test and measurement are done in order to find the effect of the new fabrication process on ITO surface....[ Read more ]

Recently, organic light emitting diodes (OLEDs) have received great attention because of its great potential application in flat panel displays. In this dissertation, a new fabrication process for small pixel and high resolution passive matrix organic light emitting device (PMOLED) is developed. Besides, some ITO surface test and measurement are done in order to find the effect of the new fabrication process on ITO surface.

Organic light emitting diodes (OLEDs) consist of several thin organic layers between ITO anode and metal cathode and can be fabricated by a simple thermal deposition. These organic electroluminescent devices are high brightness, low power consumption, fast response time, flexible, low cost, wide viewing angles. These are suitable for making flat panel displays. This new display technology also can apply in both passive matrix and active matrix displays. 16X16, 64X64, 132X65 PMOLEDs are fabricated by using a simple design of intersecting anode and cathode stripes to create an array of pixels.

New fabrication process so-called row separator formation is applied. Two insulators and one semiconductor are deposited by a plasma-enhanced chemical vapor deposition. And a standard photolithography process is used for patterning row separators. The stack gets undercut and forms a mushroom shape. When the organic layers and the metal are deposited on the pattern, they are physically discontinuous by the row separators. This method can be replaced a traditional cathode shadow mask method for fabricating OLED display. A 64X64 dot matrix display with pixel size of 600X600μm² is successfully fabricated by row separator method is demonstrated. As a result, the new fabrication process for PMOLED is defined. This approach can be widely used in fabricating few tens micron pixel size PMOLED. Due to an etching process for patterning row separators, the effect of etching on ITO surface is also analyzed.